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Nanolayer Patterning Based on Surface Modification with Extreme Ultraviolet Light
Author(s) -
Moon S. W.,
Jeon C.,
Hwang H.N.,
Hwang C.C.,
Song H. J.,
Shin H.J.,
Chung S.,
Park C.Y.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200602166
Subject(s) - materials science , extreme ultraviolet lithography , surface modification , extreme ultraviolet , nanotechnology , flexibility (engineering) , fabrication , ultraviolet , reactivity (psychology) , irradiation , photonics , optoelectronics , chemical engineering , optics , laser , medicine , statistics , physics , mathematics , alternative medicine , pathology , nuclear physics , engineering
Chlorine nanolayers can be modified by extreme UV (EUV) irradiation , which can be applied to the fabrication of various surface functional‐group patterns (see igure) owing to the striking contrast in reactivity between EUV‐exposed and ‐unexposed regions. The technique provides flexibility of surface functionalization and may be applicable to the manufacture of electronic, photonic, and biomolecular nanodevices.