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Etching Masks Based on Miniemulsions: A Novel Route Towards Ordered Arrays of Surface Nanostructures
Author(s) -
Manzke A.,
Pfahler C.,
Dubbers O.,
Plettl A.,
Ziemann P.,
Crespy D.,
Schreiber E.,
Ziener U.,
Landfester K.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200601945
Subject(s) - materials science , nanopillar , miniemulsion , nanotechnology , polystyrene , plasma etching , colloid , etching (microfabrication) , annealing (glass) , nanostructure , monolayer , reactive ion etching , nanolithography , nanosphere lithography , chemical engineering , layer (electronics) , composite material , polymer , polymerization , fabrication , medicine , alternative medicine , pathology , engineering
Platinum‐complex‐loaded colloidal polystyrene particles are prepared by a miniemulsion technique and deposited on silica in hexagonally ordered monolayers. Optimized plasma and annealing procedures generate Pt particles with diameters appropriate to their metal content at interparticle distances given by the colloidal size. Serving as etching masks in a reactive‐ion etching process, the original order of colloids is transferred to nanopillars and nanoholes with aspect ratios of up to 10 (see figure).