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Nanofacet Lithography: A New Bottom‐Up Approach to Nanopatterning and Nanofabrication by Soft Replication of Spontaneously Faceted Crystal Surfaces
Author(s) -
Gabai R.,
Ismach A.,
Joselevich E.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200601625
Subject(s) - materials science , nanotechnology , replication (statistics) , nanolithography , lithography , sapphire , template , soft lithography , faceting , monolayer , nanowire , self assembly , optoelectronics , crystallography , fabrication , optics , physics , laser , chemistry , medicine , statistics , alternative medicine , mathematics , pathology
The faceting of unstable crystal surfaces provides self‐assembling templates for soft lithography, enabling the facile generation of a variety of periodic nanopatterned monolayers, nanowires, nanogrooves, nanogrids, and nanowaffles of Au and Si (the figure shows the replication of faceted sapphire to an elastomeric stamp, and then to a patterned self‐assembled monolayer).