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Solvent‐Vapor‐Assisted Imprint Lithography
Author(s) -
Voicu N. E.,
Ludwigs S.,
Crossland E. J. W.,
Andrew P.,
Steiner U.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200601599
Subject(s) - nanoimprint lithography , materials science , lithography , solvent , polymer , nanotechnology , micrometer , resist , replication (statistics) , nanolithography , chemical engineering , fabrication , optoelectronics , organic chemistry , composite material , optics , chemistry , medicine , alternative medicine , physics , statistics , pathology , layer (electronics) , mathematics , engineering
Sub‐micrometer features are replicated into high‐molecular‐weight polymer resists by using solvent‐assisted nanoimprint lithography (see figure). By swelling the polymer in a controlled solvent‐vapor atmosphere, millibar pressures and ambient temperatures are sufficient to achieve high‐fidelity replication.