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Fabrication and Structural Evaluation of Beaded Inorganic Nanostructures Using Soft‐Electron‐Beam Lithography
Author(s) -
Donthu S.,
Sun T.,
Dravid V.
Publication year - 2007
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200601223
Subject(s) - materials science , electron beam lithography , lithography , nanostructure , nanotechnology , ceramic , fabrication , bismuth , cathode ray , soft lithography , next generation lithography , x ray lithography , optoelectronics , resist , electron , composite material , metallurgy , medicine , alternative medicine , physics , layer (electronics) , pathology , quantum mechanics
Soft electron‐beam lithography , a simple high‐resolution patterning technique, is used to fabricate single‐grain‐wide nanostructures, as seen in the figure, of functional ceramic materials, such as zinc oxide and bismuth ferrite. Structural characterization of these nanostructures reveal that average grain size decreases with line width (see the plot in the figure).