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(Fe,Mn) 3 O 4 Nanochannels Fabricated by AFM Local‐Oxidation Nanolithography using Mo/Poly(methyl methacrylate) Nanomasks
Author(s) -
Pellegrino L.,
Yanagisawa Y.,
Ishikawa M.,
Matsumoto T.,
Tanaka H.,
Kawai T.
Publication year - 2006
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200600997
Subject(s) - materials science , nanolithography , etching (microfabrication) , molybdenum , methyl methacrylate , spintronics , nanotechnology , nanostructure , epitaxy , chemical engineering , ferromagnetism , polymer , fabrication , layer (electronics) , composite material , metallurgy , polymerization , medicine , alternative medicine , physics , pathology , quantum mechanics , engineering
Epitaxial (Fe,Mn) 3 O 4 thin films are patterned into nanochannels using molybdenum/poly(methyl methacrylate) (PMMA) nanomasks realized by combining local anodic oxidation of Mo and dry etching of PMMA. Nanostructures on the 100 nm scale can be easily fabricated by subsequent wet chemical etching with H 3 PO 4 (see figure). (Fe,Mn) 3 O 4 nanochannels open the possibility of fabricating spin‐polarized nanocircuits for room‐temperature spintronics.