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Particle Surface Design using an All‐Dry Encapsulation Method
Author(s) -
Lau K. K. S.,
Gleason K. K.
Publication year - 2006
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200600896
Subject(s) - materials science , polymer , adsorption , monomer , chemical engineering , coating , polymerization , molecule , water vapor , nanoscopic scale , radical , stoichiometry , surface modification , particle size , chemical vapor deposition , functional polymers , polymer chemistry , nanotechnology , organic chemistry , composite material , chemistry , engineering
Initiated chemical vapor deposition enables an all‐dry encapsulation of fine particles down to the nanoscale by functional polymers. Initiator vapor is first thermally activated to form primary radicals, which, together with the monomer vapor, are adsorbed onto the particle surface where free‐radical polymerization creates a stoichiometric polymer coating (see figure). This polymer coating can subsequently be immobilized with other desired functional molecules.