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Evaporation‐Induced Self‐Assembly (EISA) at Its Limit: Ultrathin, Crystalline Patterns by Templating of Micellar Monolayers
Author(s) -
Brezesinski T.,
Groenewolt M.,
Gibaud A.,
Pin.,
Antonietti M.,
Smarsly B.
Publication year - 2006
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200600258
Subject(s) - crystallinity , evaporation , monolayer , materials science , oxide , self assembly , nanotechnology , limit (mathematics) , chemical engineering , physics , composite material , mathematical analysis , mathematics , engineering , metallurgy , thermodynamics
Ultrathin, highly crystalline, mesostructured metal oxide layers , as shown in the figure, have been prepared by sol–gel processing using a modified evaporation‐induced self‐assembly (EISA) approach. This approach can be exploited for the generation of periodic surface structures featuring a well‐defined in‐plane mesostructure and a high crystallinity at the same time.