Evaporation‐Induced Self‐Assembly (EISA) at Its Limit: Ultrathin, Crystalline Patterns by Templating of Micellar Monolayers | Zendy

Brezesinski T. | Zendy; Groenewolt M. | Zendy; Gibaud A. | Zendy; Pin. | Zendy; Antonietti M. | Zendy; Smarsly B. | Zendy

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Evaporation‐Induced Self‐Assembly (EISA) at Its Limit: Ultrathin, Crystalline Patterns by Templating of Micellar Monolayers

Author(s) -

Brezesinski T.,

Groenewolt M.,

Gibaud A.,

Pin.,

Antonietti M.,

Smarsly B.

Publication year - 2006

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200600258

Subject(s) - crystallinity , evaporation , monolayer , materials science , oxide , self assembly , nanotechnology , limit (mathematics) , chemical engineering , physics , composite material , mathematical analysis , mathematics , engineering , metallurgy , thermodynamics

Ultrathin, highly crystalline, mesostructured metal oxide layers , as shown in the figure, have been prepared by sol–gel processing using a modified evaporation‐induced self‐assembly (EISA) approach. This approach can be exploited for the generation of periodic surface structures featuring a well‐defined in‐plane mesostructure and a high crystallinity at the same time.

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