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3D Polymer Microframes That Exploit Length‐Scale‐Dependent Mechanical Behavior
Author(s) -
Jang J.H.,
Ullal C. K.,
Choi T.,
Lemieux M. C.,
Tsukruk V. V.,
Thomas E. L.
Publication year - 2006
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200600249
Subject(s) - materials science , polymer , lithography , length scale , micrometer , monomer , nanotechnology , holography , scale (ratio) , composite material , optoelectronics , optics , physics , quantum mechanics
Holographic interference lithography is used to create a 3D polymer microframe with sub‐micrometer periodicity, low density, and 200 nm feature size. These structures exhibit interesting deformational characteristics (see figure) with ultimate strains reaching ca. 300 %, much higher than the strains attainable in bulk films of either the fully crosslinked solid polymeric material or the uncrosslinked glassy monomer precursor.