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Hybrid Approaches to Nanolithography: Photolithographic Structures with Precise, Controllable Nanometer‐Scale Spacings Created by Molecular Rulers
Author(s) -
Anderson M. E.,
Mihok M.,
Tanaka H.,
Tan L.P.,
Horn M. W.,
McCarty G. S.,
Weiss P. S.
Publication year - 2006
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200600108
Subject(s) - nanolithography , materials science , nanotechnology , lithography , nanoscopic scale , nanometre , fabrication , resist , nanostructure , dip pen nanolithography , optoelectronics , composite material , medicine , alternative medicine , pathology , layer (electronics)
A hybrid approach to nanolithography combines conventional lithography with chemical self‐assembly to yield aligned microstructures with tailored nanoscale spacings (see figure). Self‐assembled multilayers form precise resists to create hierarchical nanostructures with the controlled orientation and dimensions necessary for nanoscale device fabrication.