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Surface Modification of Glass Substrates for Oxide Heteroepitaxy: Pasteable Three‐Dimensionally Oriented Layered Oxide Thin Films
Author(s) -
Ohta H.,
Mizutani A.,
Sugiura K.,
Hirano M.,
Hosono H.,
Koumoto K.
Publication year - 2006
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200502606
Subject(s) - materials science , amorphous solid , substrate (aquarium) , epitaxy , dissolution , oxide , layer (electronics) , thin film , polymer substrate , composite material , nanotechnology , chemical engineering , metallurgy , crystallography , oceanography , chemistry , engineering , geology
An epitaxially grown Na x CoO 2 film can be peeled off from its α‐Al 2 O 3 substrate by dissolving the interfacial layer between the film and the substrate in water, as shown in the figure. The freestanding film thus formed can be pasted on an amorphous glass substrate and used for growing an epitaxial ZnO film. This method can be used to impart atomic regularity to amorphous glass, polymer, and metal surfaces.