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Ultraflat Ternary Nanopatterns Fabricated Using Colloidal Lithography
Author(s) -
Wright J. P.,
Worsfold O.,
Whitehouse C.,
Himmelhaus M.
Publication year - 2006
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200502188
Subject(s) - materials science , ternary operation , nanotechnology , lithography , evaporation , stripping (fiber) , mica , sputtering , colloid , thin film , chemical engineering , optoelectronics , metallurgy , composite material , computer science , engineering , programming language , physics , thermodynamics
Colloidal lithography on mica has been combined with subsequent thermal evaporation, sputtering, and template‐stripping processes to produce ultraflat ternary nanopatterns of large lateral extension (see Figure). The resulting surface is particularly useful for applications that demand proper distinction between complex surface chemistry and topography.