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DNA as an Electron‐Beam‐Sensitive Reagent for Nanopatterning
Author(s) -
Lin H.Y.,
Tsai L.C.,
Chi P.Y.,
Chen C.D.
Publication year - 2006
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200502083
Subject(s) - reagent , materials science , nanotechnology , dna , fabrication , nanoparticle , nanostructure , nanoscopic scale , colloidal gold , electron beam lithography , cathode ray , electron , layer (electronics) , resist , chemistry , biochemistry , physics , organic chemistry , medicine , alternative medicine , pathology , quantum mechanics
Gold nanoparticle patterns (see figure) produced using a DNA molecular layer as an electron‐beam‐sensitive reagent are reported. The authors subjected thiolated single‐strand DNA to a focused electron beam, resulting in the inhibition of hybridization to complementary strands, and then used gold nanoparticles to reveal nanoscale patterns. This technique has potential applications in the fabrication of DNA‐based nanostructures.