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Localized Functionalization of Single Nanopores
Author(s) -
Nilsson J.,
Lee J. R. I.,
Ratto T. V.,
Létant S. E.
Publication year - 2006
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200501991
Subject(s) - nanopore , surface modification , materials science , silane , nanotechnology , silicon , ion beam , oxide , silicon oxide , focused ion beam , ion , chemical engineering , layer (electronics) , optoelectronics , composite material , organic chemistry , chemistry , silicon nitride , metallurgy , engineering
Chemical functionality is localized at the entrance of single nanopores using the controlled growth of an oxide ring. Nanopores fabricated by focused‐ion‐beam machining on silicon platforms (see Figure and Cover) are locally functionalized by ion‐beam‐assisted oxide deposition followed by immobilization of DNA probes via silane chemistry. Ion‐current measurements are used to demonstrate nanopore functionalization.