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High‐Resolution Patterning of Molecular Glasses Using Supercritical Carbon Dioxide
Author(s) -
Felix N. M.,
Tsuchiya K.,
Ober C. K.
Publication year - 2006
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200501802
Subject(s) - supercritical carbon dioxide , materials science , supercritical fluid , benzene , molecule , fluorine , silicon , chemical engineering , silicon dioxide , nanotechnology , organic chemistry , optoelectronics , composite material , chemistry , engineering , metallurgy
A glass‐forming molecule , consisting of hexa(hydroxyphenyl)benzene [HHPB] protected with six tert ‐butoxycarbonyl ( t ‐Boc) groups, is patterned and developed to produce features as small as 50 nm (see Figure) using supercritical CO 2 (scCO 2 ). Protected HHPB was shown to be completely soluble in scCO 2 without incorporation of either fluorine or silicon but could be rendered insoluble in scCO 2 by acid‐catalyzed removal of the solubilizing t ‐Boc groups.
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