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High‐Temperature Lasing Characteristics of ZnO Epilayers
Author(s) -
Li H. D.,
Yu S. F.,
Lau S. P.,
Leong E. S. P.,
Yang H. Y.,
Chen T. P.,
Abiyasa A. P.,
Ng C. Y.
Publication year - 2006
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200501693
Subject(s) - materials science , lasing threshold , optoelectronics , substrate (aquarium) , random laser , laser , wavelength , excited state , atmospheric temperature range , optics , atomic physics , oceanography , physics , meteorology , geology
Coherent random lasing has been observed inside nanostructured ZnO epilayers up to 570 K. The corresponding characteristic temperature is ∼127 K. The confinement of excited carriers inside ZnO grains and the size flexibility of the random cavities maintain optical gain at high temperatures. This unique behavior will lead to the development of novel ZnO UV lasers tunable over a wide wavelength range by controlling the substrate temperature.