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Lateral Templating for Guided Self‐Organization of Sputter Morphologies
Author(s) -
Cuenat A.,
George H. B.,
Chang K.C.,
Blakely J. M.,
Aziz M. J.
Publication year - 2005
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200500717
Subject(s) - materials science , substrate (aquarium) , range (aeronautics) , order (exchange) , nanotechnology , composite material , oceanography , geology , finance , economics
Spontaneously emerging topographic patterns on a Si(100) substrate are guided to develop long‐range order (see Figure) by using prefabricated boundaries on the area on which they organize. The density of topological defects, such as dislocations, is minimized when the ratio of the spacing between boundaries to the naturally arising spatial period is near an integer value.