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Line Defects Embedded in Three‐Dimensional Photonic Crystals
Author(s) -
Yan Q.,
Zhou Z.,
Zhao X. S.,
Chua S. J.
Publication year - 2005
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200500047
Subject(s) - photoresist , materials science , photolithography , colloidal crystal , photonic crystal , colloid , colloidal silica , nanotechnology , crystal (programming language) , line (geometry) , optoelectronics , chemical engineering , layer (electronics) , geometry , mathematics , computer science , engineering , programming language , coating
Conventional optical photolithography is used to create photoresist patterns on a preformed silica colloidal crystal film. Upon regrowth of the same silica colloidal crystal followed by removal of the photoresist patterns, air–core line defects are successfully introduced into the self‐assembled silica colloidal crystal (see Figure and inside cover).