Line Defects Embedded in Three‐Dimensional Photonic Crystals | Zendy

Yan Q. | Zendy; Zhou Z. | Zendy; Zhao X. S. | Zendy; Chua S. J. | Zendy

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Line Defects Embedded in Three‐Dimensional Photonic Crystals

Author(s) -

Yan Q.,

Zhou Z.,

Zhao X. S.,

Chua S. J.

Publication year - 2005

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200500047

Subject(s) - photoresist , materials science , photolithography , colloidal crystal , photonic crystal , colloid , colloidal silica , nanotechnology , crystal (programming language) , line (geometry) , optoelectronics , chemical engineering , layer (electronics) , geometry , mathematics , computer science , engineering , programming language , coating

Conventional optical photolithography is used to create photoresist patterns on a preformed silica colloidal crystal film. Upon regrowth of the same silica colloidal crystal followed by removal of the photoresist patterns, air–core line defects are successfully introduced into the self‐assembled silica colloidal crystal (see Figure and inside cover).

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