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Nanoporous Thin Films from Self‐Assembled Metallo‐ Supramolecular Block Copolymers
Author(s) -
Fustin C.A.,
Lohmeijer B. G. G.,
Duwez A.S.,
Jonas A. M.,
Schubert U. S.,
Gohy J.F.
Publication year - 2005
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200402073
Subject(s) - copolymer , nanoporous , materials science , supramolecular chemistry , self assembly , thin film , substrate (aquarium) , polymer , supramolecular polymers , nanotechnology , polymer chemistry , ligand (biochemistry) , chemical engineering , polymer science , molecule , organic chemistry , composite material , chemistry , biochemistry , oceanography , receptor , geology , engineering
Nanoporous thin polymer films have been produced by a simple two‐step approach using metallo‐supramolecular block copolymers as the starting materials. The first step is the self‐assembly of the copolymer, yielding cylindrical microdomains oriented normal to the substrate. The second step involves the opening of the metal–ligand complex located at the junction of the two blocks by redox chemistry to release the minor block and create the pores (see Figure).