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Patterned Gold‐Nanoparticle Monolayers Assembled on the Oxide of Silicon
Author(s) -
Foster E. W.,
Kearns G. J.,
Goto S.,
Hutchison J. E.
Publication year - 2005
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200401728
Subject(s) - materials science , monolayer , lithography , nanotechnology , nanoparticle , silicon , colloidal gold , oxide , silicon dioxide , nanoscopic scale , self assembled monolayer , silicon oxide , self assembly , optoelectronics , composite material , metallurgy , silicon nitride
Patterned monolayers of gold nanoparticles are selectively formed on Hf 4+ ‐modified silicon dioxide. The 1.5 nm diameter particles are functionalized with a phosphonic acid ligand shell and assembled from solution on a native oxide surface that has been patterned with Hf 4+ ions, as shown in the Figure. This system integrates nanoscale components and lithographic patterning. The technique used is precise and compatible with other lithographic techniques.