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Lithography‐Free, Self‐Aligned Inkjet Printing with Sub‐Hundred‐Nanometer Resolution
Author(s) -
Sele C. W.,
von Werne T.,
Friend R. H.,
Sirringhaus H.
Publication year - 2005
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200401285
Subject(s) - materials science , lithography , inkjet printing , nanotechnology , nanometre , nanoscopic scale , fabrication , polymer , resolution (logic) , transistor , inkwell , optoelectronics , electrical engineering , computer science , composite material , medicine , alternative medicine , engineering , pathology , voltage , artificial intelligence
Direct inkjet printing of sub‐100 nm nanoscale gaps , without the need for any high‐resolution lithography, is made possible by a novel self‐aligned printing method (see Figure). The benefits of this method are demonstrated by fabrication of all‐polymer transistor circuits, which exhibit switching speeds at least two orders of magnitude higher than those previously reported for inkjet‐printed polymer devices.