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Room‐Temperature, Low‐Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers
Author(s) -
Cheng X.,
Guo L. J.,
Fu P.F.
Publication year - 2005
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200401192
Subject(s) - materials science , nanoimprint lithography , photopolymer , cationic polymerization , lithography , silicone , monomer , substrate (aquarium) , resist , photolithography , polymerization , layer (electronics) , adhesive , pressure sensitive , composite material , nanotechnology , chemical engineering , polymer , optoelectronics , polymer chemistry , fabrication , medicine , oceanography , alternative medicine , pathology , geology , engineering
A new UV‐curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV‐assisted nanoimprint lithography. Uniform films with thicknesses ranging from below 50 nm to over 1 μm can be easily spin‐coated using a suitable undercoating layer on a substrate. Patterns with feature sizes ranging from tens of micrometers to 20 nm (see Figure) are imprinted at room temperature with a pressure of less than 0.1 MPa.