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Imprinting Well‐Controlled Nanopores in Organosilicate Dielectric Films: Triethoxysilyl‐Modified Six‐Armed Poly(ϵ‐caprolactone) and Its Chemical Hybridization with an Organosilicate Precursor
Author(s) -
Lee B.,
Oh W.,
Hwang Y.,
Park Y.H.,
Yoon J.,
Jin K. S.,
Heo K.,
Kim J.,
Kim K.W.,
Ree M.
Publication year - 2005
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200400919
Subject(s) - materials science , nanopore , molecule , caprolactone , thermal decomposition , thin film , chemical engineering , dielectric , chemical modification , polymer chemistry , copolymer , nanotechnology , polymer , organic chemistry , composite material , chemistry , optoelectronics , engineering
A triethoxysilyl‐terminated, six‐armed poly(ϵ‐caprolactone) porogen is synthesized and the terminal groups are found to significantly reduce the aggregation of the porogen molecules in an organosilicate precursor via their hybridization reaction with the precursor. The porogen molecules successfully imprint nanopores in the organosilicate dielectric thin film (see Figure) through their sacrificial thermal decomposition.