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TiO 2 Inverse Opals Fabricated Using Low‐Temperature Atomic Layer Deposition
Author(s) -
King J. S.,
Graugnard E.,
Summers C. J.
Publication year - 2005
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200400648
Subject(s) - materials science , atomic layer deposition , photonic crystal , inverse , conformal coating , annealing (glass) , photonics , conformal map , deposition (geology) , band gap , surface roughness , optoelectronics , layer (electronics) , surface finish , composite material , coating , paleontology , geometry , mathematics , sediment , biology , mathematical analysis
High‐quality inverse‐opal photonic crystals (see Figure) are formed by TiO 2 infiltration and subsequent removal of SiO 2 opal templates. Low‐temperature atomic layer deposition followed by annealing yields highly conformal infiltrations with extremely smooth surfaces (less than 1 nm root‐mean‐square roughness) and filling fractions of ∼ 88 %. Photonic‐bandgap properties were determined using UV‐vis reflectivity and transmission measurements.