Premium
Patterning of Thin‐Film Microstructures on Non‐Planar Substrate Surfaces Using Decal Transfer Lithography
Author(s) -
Childs W. R.,
Nuzzo R. G.
Publication year - 2004
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200400592
Subject(s) - materials science , lithography , thin film , substrate (aquarium) , soft lithography , microstructure , reactive ion etching , planar , etching (microfabrication) , amorphous solid , photolithography , silicon , optoelectronics , nanotechnology , fabrication , composite material , crystallography , layer (electronics) , medicine , oceanography , alternative medicine , computer graphics (images) , chemistry , pathology , computer science , geology
Soft‐lithographic patterning of thin‐film material microstructures supported on spherically curved lenses (see Figure) using an extension of decal transfer lithography (DTL) is reported. These processes have been used to successfully create a pattern of amorphous silicon and gold thin‐film microstructures with feature sizes ranging from 2 μm to 75 μm. This has been achieved without noticeable defects using wet and reactive‐ion etching processes across large substrate areas.