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Strongly Enhanced Thermal Stability of Crystalline Organic Thin Films Induced by Aluminum Oxide Capping Layers
Author(s) -
Sellner S.,
Gerlach A.,
Schreiber F.,
Kelsch M.,
Kasper N.,
Dosch H.,
Meyer S.,
Pflaum J.,
Fischer M.,
Gompf B.
Publication year - 2004
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200400461
Subject(s) - materials science , thermal stability , thin film , aluminium , oxide , diffraction , chemical engineering , desorption , semiconductor , thermal , aluminum oxide , thermal desorption spectroscopy , nanotechnology , composite material , optoelectronics , optics , metallurgy , adsorption , organic chemistry , chemistry , physics , meteorology , engineering
The thermal stability of thin films of di‐indenoperylene (DIP) , an organic semiconductor is shown via thermal desorption spectroscopy (TDS) and in‐situ X‐ray diffraction to be strongly enhanced by aluminum oxide capping layers. Possible mechanisms for the eventual breakdown of the film (which remains crystalline up to 460 °C) at high temperatures are discussed (see Figure).