Selective Formation of Inverted Opals by Electron‐Beam Lithography | Zendy

Juárez B. H. | Zendy; Golmayo D. | Zendy; Postigo P. A. | Zendy; López C. | Zendy

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Selective Formation of Inverted Opals by Electron‐Beam Lithography

Author(s) -

Juárez B. H.,

Golmayo D.,

Postigo P. A.,

López C.

Publication year - 2004

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200400285

Subject(s) - materials science , electron beam lithography , lithography , fabrication , chemical vapor deposition , polymer , cathode ray , methyl methacrylate , nanotechnology , composite number , x ray lithography , deposition (geology) , nanolithography , stencil lithography , optoelectronics , resist , monomer , composite material , electron , layer (electronics) , alternative medicine , pathology , biology , paleontology , quantum mechanics , medicine , physics , sediment

Lateral control of the fabrication of selectively inverted opals using polymer–silica composites is reported. Poly(methyl methacrylate)–SiO 2 composite opals obtained by chemical vapor deposition can be patterned by electron‐beam lithography and developed to produce silica inverse opals with well‐defined extrinsic defects (see Figure).

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