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Selective Formation of Inverted Opals by Electron‐Beam Lithography
Author(s) -
Juárez B. H.,
Golmayo D.,
Postigo P. A.,
López C.
Publication year - 2004
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200400285
Subject(s) - materials science , electron beam lithography , lithography , fabrication , chemical vapor deposition , polymer , cathode ray , methyl methacrylate , nanotechnology , composite number , x ray lithography , deposition (geology) , nanolithography , stencil lithography , optoelectronics , resist , monomer , composite material , electron , layer (electronics) , alternative medicine , pathology , biology , paleontology , quantum mechanics , medicine , physics , sediment
Lateral control of the fabrication of selectively inverted opals using polymer–silica composites is reported. Poly(methyl methacrylate)–SiO 2 composite opals obtained by chemical vapor deposition can be patterned by electron‐beam lithography and developed to produce silica inverse opals with well‐defined extrinsic defects (see Figure).