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Thermomechanical Lithography: Pattern Replication Using a Temperature Gradient Driven Instability
Author(s) -
Schäffer E.,
Harkema S.,
Roerdink M.,
Blossey R.,
Steiner U.
Publication year - 2003
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200390119
Subject(s) - materials science , instability , temperature gradient , lithography , replication (statistics) , micrometer , diffusion , capillary action , nanotechnology , optics , mechanics , composite material , optoelectronics , thermodynamics , physics , quantum mechanics , statistics , mathematics
A capillary surface instability caused by a high temperature gradient is used to replicate sub‐micrometer patterns (see Figure for an example). As opposed to convection effects, the film instability is driven by the diffusion of heat across the polymer film. By lateral modulation of the temperature gradient, this instability can be harnessed as a lithographic technique.