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Selective Dewetting for General Purpose Patterning
Author(s) -
Kim Y.S.,
Lee H.H.
Publication year - 2003
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200390082
Subject(s) - dewetting , materials science , micrometer , nanotechnology , nanometre , mold , elastomer , nanostructure , optoelectronics , thin film , composite material , optics , physics
General purpose patterning based on selective dewetting with an elastomeric mold is described. Several well‐defined nanostructures obtained by this method are presented (see Figure for an example). Unlike other patterning techniques, the same mold can be used to generate features ranging in size from the nanometer to the micrometer, simply by changing the duration of dewetting.