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Patterning of Polypeptide Thin Films by the Combination of Surface‐Initiated Vapor‐Deposition Polymerization and Photolithography
Author(s) -
Wang Y.,
Chang Y.C.
Publication year - 2003
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200390069
Subject(s) - materials science , photolithography , polymerization , deposition (geology) , nanotechnology , thin film , solvent , micrometer , chemical vapor deposition , lithography , chemical engineering , polymer , organic chemistry , optoelectronics , composite material , optics , chemistry , paleontology , physics , engineering , sediment , biology
A solvent‐free strategy offering a fast, economical, and clean approach to integrate polypeptide materials into micrometer‐scale devices is presented. The dimensions and compositions can be controlled in both the lateral and vertical directions. The Figure shows a surface‐grafted pattern composed of PMLG (poly(γ‐methyl‐ L ‐glutamate)) and PMLG‐ b ‐PBLG, (B indicates benzyl instead of methyl).