Patterning of Polypeptide Thin Films by the Combination of Surface‐Initiated Vapor‐Deposition Polymerization and Photolithography | Zendy

Wang Y. | Zendy; Chang Y.C. | Zendy

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Patterning of Polypeptide Thin Films by the Combination of Surface‐Initiated Vapor‐Deposition Polymerization and Photolithography

Author(s) -

Wang Y.,

Chang Y.C.

Publication year - 2003

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200390069

Subject(s) - materials science , photolithography , polymerization , deposition (geology) , nanotechnology , thin film , solvent , micrometer , chemical vapor deposition , lithography , chemical engineering , polymer , organic chemistry , optoelectronics , composite material , optics , chemistry , paleontology , physics , engineering , sediment , biology

A solvent‐free strategy offering a fast, economical, and clean approach to integrate polypeptide materials into micrometer‐scale devices is presented. The dimensions and compositions can be controlled in both the lateral and vertical directions. The Figure shows a surface‐grafted pattern composed of PMLG (poly(γ‐methyl‐ L ‐glutamate)) and PMLG‐ b ‐PBLG, (B indicates benzyl instead of methyl).

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