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Ordered Arrays of Nanopillars Formed by Photoelectrochemical Etching on Directly Imprinted TiO 2 Single Crystals
Author(s) -
Masuda H.,
Kanezawa K.,
Nakao M.,
Yokoo A.,
Tamamura T.,
Sugiura T.,
Minoura H.,
Nishio K.
Publication year - 2003
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200390034
Subject(s) - nanopillar , materials science , etching (microfabrication) , scanning electron microscope , single crystal , nanotechnology , optoelectronics , chemical engineering , nanostructure , composite material , crystallography , layer (electronics) , chemistry , engineering
Arrays of TiO 2 nanopillars have been prepared by photochemically etching a TiO 2 single crystal that had been previously imprinted with a corresponding array of dimples using SiC molds. The pillars have a high aspect ratio (see scanning electron microscopy (SEM) image in Figure) and the method is simple and suitable for high‐throughput production.

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