Patterning of Substrates Using Surface Relief Structures on an Azobenzene‐Functionalized Polymer Film | Zendy

Yang S. | Zendy; Yang K. | Zendy; Niu L. | Zendy; Nagarajan R. | Zendy; Bian S. | Zendy; Jain A. K. | Zendy; Kumar J. | Zendy

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Patterning of Substrates Using Surface Relief Structures on an Azobenzene‐Functionalized Polymer Film

Author(s) -

Yang S.,

Yang K.,

Niu L.,

Nagarajan R.,

Bian S.,

Jain A. K.,

Kumar J.

Publication year - 2004

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200306537

Subject(s) - azobenzene , materials science , indium tin oxide , substrate (aquarium) , polymer , polymer substrate , etching (microfabrication) , chemical engineering , indium , nanotechnology , layer (electronics) , optoelectronics , composite material , oceanography , geology , engineering

A maskless method for patterning substrates using surface relief structures on azobenzene‐functionalized polymer is demonstrated. Surface relief structures are inscribed on a polymer film spin‐coated on an indium tin oxide (ITO) substrate by exposure to an interference pattern. Etching with oxygen plasma followed by a zinc‐powder‐catalyzed liquid etchant yields a periodically patterned ITO substrate (see Figure).

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