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Patterning of Substrates Using Surface Relief Structures on an Azobenzene‐Functionalized Polymer Film
Author(s) -
Yang S.,
Yang K.,
Niu L.,
Nagarajan R.,
Bian S.,
Jain A. K.,
Kumar J.
Publication year - 2004
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200306537
Subject(s) - azobenzene , materials science , indium tin oxide , substrate (aquarium) , polymer , polymer substrate , etching (microfabrication) , chemical engineering , indium , nanotechnology , layer (electronics) , optoelectronics , composite material , oceanography , geology , engineering
A maskless method for patterning substrates using surface relief structures on azobenzene‐functionalized polymer is demonstrated. Surface relief structures are inscribed on a polymer film spin‐coated on an indium tin oxide (ITO) substrate by exposure to an interference pattern. Etching with oxygen plasma followed by a zinc‐powder‐catalyzed liquid etchant yields a periodically patterned ITO substrate (see Figure).