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Dip‐Pen Nanolithography of Chemical Templates on Silicon Oxide
Author(s) -
Kooi S. E.,
Baker L. A.,
Sheehan P. E.,
Whitman L. J.
Publication year - 2004
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200306468
Subject(s) - template , materials science , dip pen nanolithography , nanolithography , nanotechnology , covalent bond , silicon , nanometre , silicon oxide , ethylene glycol , cantilever , nanostructure , ethylene oxide , chemical engineering , copolymer , optoelectronics , fabrication , silicon nitride , organic chemistry , chemistry , polymer , medicine , alternative medicine , pathology , engineering , composite material , layer (electronics)
A flexible template strategy for the generation of nanometer‐scale templates via dip‐pen nanolithography is described. Trichlorosilanes are patterned with a chemically modified cantilever, and subsequently oxidized. The reactive template formed can be further modified by covalent attachment (e.g., of poly(ethylene imine), see Figure) or via electrostatic immobilization (e.g., of CdSe).