Dip‐Pen Nanolithography of Chemical Templates on Silicon Oxide | Zendy

Kooi S. E. | Zendy; Baker L. A. | Zendy; Sheehan P. E. | Zendy; Whitman L. J. | Zendy

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Dip‐Pen Nanolithography of Chemical Templates on Silicon Oxide

Author(s) -

Kooi S. E.,

Baker L. A.,

Sheehan P. E.,

Whitman L. J.

Publication year - 2004

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200306468

Subject(s) - template , materials science , dip pen nanolithography , nanolithography , nanotechnology , covalent bond , silicon , nanometre , silicon oxide , ethylene glycol , cantilever , nanostructure , ethylene oxide , chemical engineering , copolymer , optoelectronics , fabrication , silicon nitride , organic chemistry , chemistry , polymer , medicine , alternative medicine , pathology , engineering , composite material , layer (electronics)

A flexible template strategy for the generation of nanometer‐scale templates via dip‐pen nanolithography is described. Trichlorosilanes are patterned with a chemically modified cantilever, and subsequently oxidized. The reactive template formed can be further modified by covalent attachment (e.g., of poly(ethylene imine), see Figure) or via electrostatic immobilization (e.g., of CdSe).

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