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Smooth Continuous Films of Stoichiometric Silicon Carbide from Poly(methylsilyne)
Author(s) -
Pitcher M. W.,
Joray S. J.,
Bianconi P. A.
Publication year - 2004
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200306467
Subject(s) - materials science , silicon carbide , stoichiometry , silicon , pyrolysis , polymer , carbide , nanotechnology , chemical engineering , composite material , optoelectronics , organic chemistry , chemistry , engineering
A new synthesis of the silicon‐network‐backbone polymer poly(methylsilyne) gives a material that is easily converted by pyrolysis to smooth continous films of stoichiometric silicon carbide (see Figure). The films are adherent to the silicon or alumina substrates, and show root mean square roughness of 169 Å over a 500 μm range. Applications in electronics are envisaged.