Metallic Thin Films of TTF[Ni(dmit) 2 ] 2  by Electrodeposition on (001)‐Oriented Silicon Substrates | Zendy

de Caro D. | Zendy; Fraxedas J. | Zendy; Faulmann C. | Zendy; Malfant I. | Zendy; Milon J. | Zendy; Lamère J.F. | Zendy; Collière V. | Zendy; Valade L. | Zendy

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Metallic Thin Films of TTF[Ni(dmit) 2 ] 2 by Electrodeposition on (001)‐Oriented Silicon Substrates

Author(s) -

de Caro D.,

Fraxedas J.,

Faulmann C.,

Malfant I.,

Milon J.,

Lamère J.F.,

Collière V.,

Valade L.

Publication year - 2004

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200306427

Subject(s) - materials science , thin film , silicon , metal , crystallite , conductivity , electrical resistivity and conductivity , polycrystalline silicon , character (mathematics) , nanotechnology , optoelectronics , metallurgy , thin film transistor , chemistry , electrical engineering , layer (electronics) , geometry , mathematics , engineering

Thin films of organic metals generally exhibit activated conductivity caused by intergrain conduction barriers. One of the few examples of thin films showing truly metallic character is TTF[Ni(dmit) 2 ] 2 . Films electrodeposited on silicon substrates remain metallic down to 12 K in spite of their polycrystalline morphology (see Figure).

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