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Nanoporous Ultra‐Low‐κ Fluoropolymer Composite Films via Plasma Polymerization of Allylpentafluorobenzene and Magnetron Sputtering of Poly(tetrafluoroethylene)
Author(s) -
Fu G. D.,
Zhang Y.,
Kang E.T.,
Neoh K.G.
Publication year - 2004
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200306290
Subject(s) - fluoropolymer , nanoporous , materials science , tetrafluoroethylene , composite number , sputter deposition , dielectric , plasma polymerization , polymerization , composite material , cavity magnetron , plasma , chemical engineering , sputtering , polymer chemistry , thin film , copolymer , optoelectronics , nanotechnology , polymer , engineering , physics , quantum mechanics
Fluoropolymer composite films with nanoporous morphology and dielectric constants less than 2.0, consisting of plasma‐polymerized allylpentafluorobenzene (pp‐APFB) nanospheres and magnetron sputter‐deposited poly(tetrafluoroethylene) (s‐PTFE) dense layers, have been prepared on hydrogen‐terminated Si(100) (H‐Si) substrates (see Figure).