Magnetic Ceramic Films from a Metallopolymer Resist Using Reactive Ion Etching in a Secondary Magnetic Field | Zendy

Clendenning S. B. | Zendy; Han S. | Zendy; Coombs N. | Zendy; Paquet C. | Zendy; Rayat M. S. | Zendy; Grozea D. | Zendy; Brodersen P. M. | Zendy; Sodhi R. N. S. | Zendy; Yip C. M. | Zendy; Lu Z.H. | Zendy; Manners I. | Zendy

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Magnetic Ceramic Films from a Metallopolymer Resist Using Reactive Ion Etching in a Secondary Magnetic Field

Author(s) -

Clendenning S. B.,

Han S.,

Coombs N.,

Paquet C.,

Rayat M. S.,

Grozea D.,

Brodersen P. M.,

Sodhi R. N. S.,

Yip C. M.,

Lu Z.H.,

Manners I.

Publication year - 2004

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200306262

Subject(s) - materials science , reactive ion etching , spintronics , resist , etching (microfabrication) , ceramic , nanotechnology , magnetic field , plasma etching , composite material , ferromagnetism , condensed matter physics , layer (electronics) , quantum mechanics , physics

Magnetic ceramic films containing metal‐rich nanoworm reticulations 200–550 nm wide have been fabricated from a highly metallized metallopolymer resist (see Figure) using oxygen or hydrogen plasma reactive ion etching in a secondary magnetic field. Applications may be found in spintronics and logic circuits.

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