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Magnetic Ceramic Films from a Metallopolymer Resist Using Reactive Ion Etching in a Secondary Magnetic Field
Author(s) -
Clendenning S. B.,
Han S.,
Coombs N.,
Paquet C.,
Rayat M. S.,
Grozea D.,
Brodersen P. M.,
Sodhi R. N. S.,
Yip C. M.,
Lu Z.H.,
Manners I.
Publication year - 2004
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200306262
Subject(s) - materials science , reactive ion etching , spintronics , resist , etching (microfabrication) , ceramic , nanotechnology , magnetic field , plasma etching , composite material , ferromagnetism , condensed matter physics , layer (electronics) , quantum mechanics , physics
Magnetic ceramic films containing metal‐rich nanoworm reticulations 200–550 nm wide have been fabricated from a highly metallized metallopolymer resist (see Figure) using oxygen or hydrogen plasma reactive ion etching in a secondary magnetic field. Applications may be found in spintronics and logic circuits.