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Self‐Organized Complex Patterning: Langmuir–Blodgett Lithography
Author(s) -
Lenhert S.,
Zhang L.,
Mueller J.,
Wiesmann H. P.,
Erker G.,
Fuchs H.,
Chi L.
Publication year - 2004
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200306203
Subject(s) - langmuir–blodgett film , materials science , nanolithography , monolayer , resist , lithography , nanotechnology , dip pen nanolithography , etching (microfabrication) , polymer , self assembly , self assembled monolayer , optoelectronics , layer (electronics) , fabrication , composite material , medicine , alternative medicine , pathology
Self‐patterning monolayer films prepared by the Langmuir–Blodgett technique have been used as resists for anisotropic chemical etching of Si 〈100〉. The resulting topographies are transferred onto polymer surfaces to guide the growth of biological cells. This method allows rapid and simple nanolithography of complex nanopatterns over large areas.