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Facile Photofabrication of Stable, Submicrometer‐Wide, Electrically Conductive Patterns
Author(s) -
Keum C.D.,
Fukuda T.,
Matsuda H.,
Tamada K.
Publication year - 2004
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200306175
Subject(s) - materials science , electrical conductor , fabrication , annealing (glass) , electrical resistivity and conductivity , nanoparticle , optoelectronics , conductive polymer , nanotechnology , wavelength , electrically conductive , composite material , polymer , electrical engineering , medicine , alternative medicine , pathology , engineering
A fabrication method for submicrometer‐wide electric conductive patterns using Ag nanoparticle/polymer composites on furan‐functionalized substrates (see Figure) is reported. A 180 nm wide (full width at half maximum) photofabricated pattern has been achieved, well below the wavelength of incident light. After annealing at 200 °C for 40 min, the pattern worked as an electric wire with a resistivity of ∼8 × 10 –4 Ω cm.
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