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Direct Writing of Patterned Ceramics Using Electron‐Beam Lithography and Metallopolymer Resists
Author(s) -
Clendenning S. B.,
Aouba S.,
Rayat M. S.,
Grozea D.,
Sorge J. B.,
Brodersen P. M.,
Sodhi R. N. S.,
Lu Z.H.,
Yip C. M.,
Freeman M. R.,
Ruda H. E.,
Manners I.
Publication year - 2004
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200305740
Subject(s) - materials science , resist , electron beam lithography , lithography , ceramic , scanning electron microscope , cathode ray , x ray lithography , focused ion beam , nanotechnology , electron beam induced deposition , ion beam lithography , electron , optoelectronics , scanning transmission electron microscopy , ion , composite material , chemistry , physics , layer (electronics) , quantum mechanics , organic chemistry
Patterned arrays of ceramics have been fabricated using electron‐beam lithography (EBL) and a metallopolymer resist. Highly ordered arrays of dots, bars (see scanning electron microscopy and time‐of‐flight secondary ion mass spectrometry images in the Figure), and curved lines rich in Fe and Co are direct‐written on films of a highly metallized cobalt‐clusterized polyferrocenylsilane. Subsequent pyrolysis leads to ferromagnetic ceramics.