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Aerosol‐Assisted Formation of Mesostructured Thin Films
Author(s) -
Lu Y.,
McCaughey B.F.,
Wang D.,
Hampsey J.E.,
Doke N.,
Yang Z.,
Brinker C.J.
Publication year - 2003
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200305331
Subject(s) - materials science , pulmonary surfactant , coalescence (physics) , aerosol , chemical engineering , nanotechnology , planar , thin film , morphology (biology) , fabrication , organic chemistry , computer graphics (images) , chemistry , medicine , physics , alternative medicine , pathology , astrobiology , computer science , engineering , biology , genetics
A new aerosol‐assisted surfactant self‐assembly approach has been developed for large‐scale mesostructured silica thin film fabrication. The formation mechanism involves coalescence of semisolid surfactant–silica mesostructured particles on substrates (see Figure) and subsequent reassembly of the mesostructures to adapt the morphology transformation from spherical to planar shape.