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Moiré Pattern Formation on Porous Alumina Arrays Using Nanoimprint Lithography
Author(s) -
Choi J.,
Wehrspohn R.B.,
Gösele U.
Publication year - 2003
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200305251
Subject(s) - materials science , moiré pattern , nanoimprint lithography , photoresist , anodizing , nanoindentation , porosity , rotation (mathematics) , lithography , photolithography , polymer , nanotechnology , composite material , optoelectronics , optics , fabrication , geometry , aluminium , layer (electronics) , medicine , physics , alternative medicine , mathematics , pathology
Porous alumina arrays with various Moiré patterns (see Figure) are prepared by two‐step nanoindentation with different rotation angles and subsequent anodization. The patterns on the porous alumina array are in good agreement with the theory of Moiré patterns in terms of the rotation angles. In addition, replicas of photoresist polymer with the Moiré pattern are successfully prepared.