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Templated Self‐Assembly of Block Copolymers: Effect of Substrate Topography
Author(s) -
Cheng J.Y.,
Ross C.A.,
Thomas E.L.,
Smith H.I.,
Vancso G.J.
Publication year - 2003
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200305244
Subject(s) - copolymer , materials science , substrate (aquarium) , self assembly , nanoscopic scale , nanotechnology , enhanced data rates for gsm evolution , polymer , position (finance) , feature (linguistics) , block (permutation group theory) , domain (mathematical analysis) , template , cover (algebra) , geometry , computer science , composite material , artificial intelligence , mechanical engineering , mathematical analysis , linguistics , oceanography , philosophy , mathematics , finance , economics , engineering , geology
Topographical confinement is used to template the formation of nanoscale domains in a self‐assembled block copolymer film. The topographical template controls the row spacings and feature dimensions of the copolymer and can deliberately introduce defects in the arrays (see Figure). For example, a sharp edge feature leads to a missing domain and pins the lateral position of the polymer array. (See also inside cover.)