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Ultra‐Low‐ k Pure‐Silica Zeolite MFI Films Using Cyclodextrin as Porogen
Author(s) -
Li S.,
Li Z.,
Yan Y.
Publication year - 2003
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200305173
Subject(s) - zeolite , materials science , dielectric , cyclodextrin , nanoparticle , chemical engineering , miniaturization , thin film , nanotechnology , composite material , organic chemistry , catalysis , optoelectronics , chemistry , engineering
Reduction of the dielectric constant k to the ultra low‐ k range is important for the continuing miniaturization of semiconductor devices. It is demonstrated that γ‐cyclodextrin can act as an effective porogen (see Figure) to reduce k while maintaining good film strength. A continuous thin pure‐silica zeolite MFI film with k = 1.8 and elastic modulus of 14 GPa is reported, prepared by spin‐on from a zeolite nanoparticle suspension.
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