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Direction‐Selective and Length‐Tunable In‐Plane Growth of Carbon Nanotubes
Author(s) -
Cao A.,
Baskaran R.,
Frederick M.J.,
Turner K.,
Ajayan P.M.,
Ramanath G.
Publication year - 2003
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200304738
Subject(s) - carbon nanotube , materials science , microelectronics , chemical vapor deposition , nanotechnology , electrode , nanotube , carbon nanotube actuators , deposition (geology) , potential applications of carbon nanotubes , cover (algebra) , carbon nanotube quantum dot , optoelectronics , plane (geometry) , optical properties of carbon nanotubes , mechanical engineering , paleontology , chemistry , geometry , mathematics , sediment , engineering , biology
Chemical vapor deposition on selectively masked SiO 2 patterns has been used to obtain controlled placement and exclusive in‐plane growth of length‐ and direction‐tunable carbon nanotubes (see Figure and inside cover). Nanotube bridges interconnecting SiO 2 patterns are fabricated, and their electrical characteristics are demonstrated. This approach holds promise for manufacturing large‐scale microelectronic systems integrated with nanotube–electrode units.

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