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Benchtop Fabrication of Submicrometer Metal Line and Island Arrays Using Passivative Microcontact Printing and Electroless Plating
Author(s) -
Moran C.E.,
Radloff C.,
Halas N.J.
Publication year - 2003
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200304507
Subject(s) - microcontact printing , materials science , photolithography , fabrication , nanotechnology , etching (microfabrication) , plating (geology) , lithography , resist , electroplating , optoelectronics , medicine , alternative medicine , pathology , layer (electronics) , geophysics , geology
An entirely benchtop method of fabricating long‐range, planar arrays of discrete metal structures on glass or SiO 2 /Si surfaces without the use of e‐beam or photolithography, resist masks, or chemical etching is reported. This approach combines microcontact printing and directed electroless plating for the controlled deposition of islands or lines of gold or silver. The Figure shows gold lines ca. 50 nm in height deposited on a pre‐patterned glass surface.