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Ruthenium Oxide Nanotube Arrays Fabricated by Atomic Layer Deposition Using a Carbon Nanotube Template
Author(s) -
Min Y.S.,
Bae E.J.,
Jeong K.S.,
Cho Y.J.,
Lee J.H.,
Choi W.B.,
Park G.S.
Publication year - 2003
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200304452
Subject(s) - materials science , nanotube , carbon nanotube , nanotechnology , atomic layer deposition , oxide , carbon nanotube supported catalyst , layer (electronics) , chemical vapor deposition , silicon , ruthenium , silicon oxide , ruthenium oxide , wafer , carbon nanotube quantum dot , scanning electron microscope , chemical engineering , deposition (geology) , optoelectronics , composite material , catalysis , organic chemistry , carbon nanofiber , metallurgy , paleontology , chemistry , silicon nitride , sediment , biology , engineering
A chemical vapor deposition‐related method (atomic layer deposition) is reported to have been successfully used to fabricate an inorganic nanotube array at low temperatures (below 400 °C) for the first time. The Figure shows a scanning electron microscopy image of a ruthenium oxide nanotube array on top of an anodic aluminum oxide (AAO) matrix on a silicon wafer after removal of the carbon nanotube template.