Ruthenium Oxide Nanotube Arrays Fabricated by Atomic Layer Deposition Using a Carbon Nanotube Template | Zendy

Min Y.S. | Zendy; Bae E.J. | Zendy; Jeong K.S. | Zendy; Cho Y.J. | Zendy; Lee J.H. | Zendy; Choi W.B. | Zendy; Park G.S. | Zendy

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Ruthenium Oxide Nanotube Arrays Fabricated by Atomic Layer Deposition Using a Carbon Nanotube Template

Author(s) -

Min Y.S.,

Bae E.J.,

Jeong K.S.,

Cho Y.J.,

Lee J.H.,

Choi W.B.,

Park G.S.

Publication year - 2003

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200304452

Subject(s) - materials science , nanotube , carbon nanotube , nanotechnology , atomic layer deposition , oxide , carbon nanotube supported catalyst , layer (electronics) , chemical vapor deposition , silicon , ruthenium , silicon oxide , ruthenium oxide , wafer , carbon nanotube quantum dot , scanning electron microscope , chemical engineering , deposition (geology) , optoelectronics , composite material , catalysis , organic chemistry , carbon nanofiber , metallurgy , paleontology , chemistry , silicon nitride , sediment , biology , engineering

A chemical vapor deposition‐related method (atomic layer deposition) is reported to have been successfully used to fabricate an inorganic nanotube array at low temperatures (below 400 °C) for the first time. The Figure shows a scanning electron microscopy image of a ruthenium oxide nanotube array on top of an anodic aluminum oxide (AAO) matrix on a silicon wafer after removal of the carbon nanotube template.

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