A Combined Top–Down/Bottom–Up Approach to the Microscopic Localization of Metallic Nanodots | Zendy

Spatz J.P. | Zendy; Chan V.Z.H. | Zendy; Mößmer S. | Zendy; Kamm F.M. | Zendy; Plettl A. | Zendy; Ziemann P. | Zendy; Möller M. | Zendy

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A Combined Top–Down/Bottom–Up Approach to the Microscopic Localization of Metallic Nanodots

Author(s) -

Spatz J.P.,

Chan V.Z.H.,

Mößmer S.,

Kamm F.M.,

Plettl A.,

Ziemann P.,

Möller M.

Publication year - 2002

Publication title -

advanced materials

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 10.707

H-Index - 527

eISSN - 1521-4095

pISSN - 0935-9648

DOI - 10.1002/adma.200290011

Subject(s) - nanodot , materials science , aperiodic graph , wafer , nanotechnology , nanoparticle , optical microscope , nanostructure , optoelectronics , optics , composite material , mathematics , scanning electron microscope , physics , combinatorics

Periodic and aperiodic two‐dimensional nanostructures with hierarchical order have been prepared by a combined top–down/bottom–up approach. This method allows 7 nm nanoparticles to be positioned with a accuracy of 10 nm or less, with a separation distance of several micrometers. The Figure is an optical dark field microscopy image of a square arrangement of Au dots on a Si wafer.

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