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A Combined Top–Down/Bottom–Up Approach to the Microscopic Localization of Metallic Nanodots
Author(s) -
Spatz J.P.,
Chan V.Z.H.,
Mößmer S.,
Kamm F.M.,
Plettl A.,
Ziemann P.,
Möller M.
Publication year - 2002
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.200290011
Subject(s) - nanodot , materials science , aperiodic graph , wafer , nanotechnology , nanoparticle , optical microscope , nanostructure , optoelectronics , optics , composite material , mathematics , scanning electron microscope , physics , combinatorics
Periodic and aperiodic two‐dimensional nanostructures with hierarchical order have been prepared by a combined top–down/bottom–up approach. This method allows 7 nm nanoparticles to be positioned with a accuracy of 10 nm or less, with a separation distance of several micrometers. The Figure is an optical dark field microscopy image of a square arrangement of Au dots on a Si wafer.