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Imaging polymers with supercritical carbon dioxide
Author(s) -
Ober Christopher K.,
Gabor Allen H.,
GallagherWetmore Paula,
Allen Robert D.
Publication year - 1997
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19970091309
Subject(s) - materials science , polymer , methacrylate , supercritical carbon dioxide , lithography , copolymer , solvent , supercritical fluid , chemical engineering , thin film , nanotechnology , selectivity , methyl methacrylate , catalysis , organic chemistry , composite material , optoelectronics , chemistry , engineering
In lithographic techniques for forming nanostructures in surface and polymer thin films, the selectivity of the solvent becomes increasingly important as the target dimensions decrease. Polymer‐based developers. The Figure shows the SC CO 2 –developed image of a copolymer of pentafluoroproyl methacrylate and tert ‐butyl methacrylate.