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Molecular patterning using two‐dimensional polymer langmuir–blodgett films
Author(s) -
Aoki Atsushi,
Miyashita Tokuji
Publication year - 1997
Publication title -
advanced materials
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 10.707
H-Index - 527
eISSN - 1521-4095
pISSN - 0935-9648
DOI - 10.1002/adma.19970090417
Subject(s) - langmuir–blodgett film , materials science , monomer , nanometre , polymer , resist , layer (electronics) , polymerization , nanotechnology , resolution (logic) , chemical engineering , monolayer , composite material , artificial intelligence , computer science , engineering
Langmuir–Blodgett (LB) films for high‐resolution resists for the preparation of integrated circuits with higher densities are reviewed briefly. A technique based on the polymerization of monomeric LB films and a newer one based on the two‐dimensional cross‐linking of a polymeric LB film are described. It is demonstrated that cross‐linkable polymeric LB films have the ability to create high‐resolution molecular patterning with nanometer (layer) thickness. Examples of patterns produced with such films are presented.